Lukasiewicz-IMiF

Lukasiewicz-IMiF

Contact persons:

Dr inż. Dariusz Szmigiel – Research Group Leader- Research Group of Silicon Technology and Microsystems

dariusz.szmigiel@imif.lukasiewicz.gov.pl

+48 22 279 32 00

Sieć Badawcza Łukasiewicz – Instytut Mikroelektroniki i Fotoniki ul. Okulickiego 5e, 05-500 Piaseczno, NIP: 5213910680

Beyond CMOSMore MooreMore than MooreSystem Integration

Main expertises

  • photonic sources (VCSELs) for systems, elements for AI hadware
  • Nanolaminates
  • Crystalline nanolayers
  • Atomic layer deposition for a wide range of materials
  • Electronic-grade graphene on SiC (epitaxial quasi-free-standing graphene on semi-insulating 6H-SiC, 4H-SiC, and defect-engineered 4H-SiC). For details visit www.graphene2get.com.
  • 2DEGs fabricated on the basis of thin-film heterostructures
  • Raman and PL characterization of 2D materials (mapping, single point)
  • ALD as a method of surface modification in 1D/NW/CNTs systems, and for tuning of their electronic, photonic etc. properties
  • Technology (thin film deposition, device fabrication) and characterisation (materials, devices) in a wide range of: oxides, thin-film heterostructures and device structures
  • Atomic layer deposition, chemical vapour deposition, physical vapour deposition techniques
  • ALD ZnO, TiO2, Al2O3 and many others
  • Microstructurisation, nanostructurisation
  • PVD deposition of p-type oxide (NiO, CuO, others)
  • 2DEGs fabricated on the basis of thin-film oxide heterostructures

Research interests

  • Phonon engineering for heat management in electronics
  • Development of low-dimensional systems with properties tuned by surface modification
  • Catalysts
  • Nanoelectronics
  • Testing of new materials and structures in the field of AO FETs and memories.
  • Development to larger (possibly semiindustrial) fabrication scales

Main expertises

  • 2DEGs fabricated on the basis of thin-film oxide heterostructures
  • ALD technique
  • photonic sources (VCSELs)
  • High-temperature thermally stable graphene-on-SiC Hall effect sensor; graphene-on-SiC dosimetric platform for passive estimation of fast-neutron fluence. For details visit www.graphene2get.com.

Research interests

  • Magnetic diagnostics in thermonuclear reactors, integrated neutron flux dosimetry in fissile and fusion reactors.

Main expertises

  • Fabrication of microfluidics structures, MEMS sensors functionalization,
  • Surface modification techniques (thin-film deposition and others)
  • Micro-, nanostructurisation techniques
  • Surface biofunctionalisation
  • Fabrication process of cantilevers incl. linear arrays

RF GaN HEMT technology

  • Si photodiodes, quadrants and arrays , Si and Ge waveguides, prototyping and low volume production,
  • VCSEL, VCSEL arrays, transparent conductive electrodes TCE,
  • Technology of distributed Bragg reflectors with tuned properties
  • Atomic layer deposition, chemical vapour deposition, physical vapour deposition techniques for functional layers in power and high-frequency devices – passivation, isolation etc.
  • Wide range of materials – nitrides, oxides, mixed – multicomponent, nanolaminates
  • TCAD simulation, technology development and characterization of GaN vertical power devices (diodes, transistors)
  • technology development and characterization of GaN HEMT power transistors (normally-off p-GaN gate, MISHEMTs etc)
  • Technology development for Gallium Oxide power devices (etching, ohmic & Schottky contacts, heterojunction fabrication etc)
  • Low temperature deposition methods for nanolayers
  • Wide range of materials – nitrides, oxides, mixed – multicomponent, nanolaminates
  • Si-based MEMS devices incl. AFM probes, cantilevers, membranes, TCDs, radiation detectors, prototyping and low volume production
  • FET detectors of THz radiation

Research interests

  • Organ-on-a-chip concept
  • Miniaturised sensors and systems, multichannel sensing platforms, lab-on-a-chip
  • Cantilever piezoelectric energy harvesters
  • All aspect of RF GaN HEMT power devices
  • All aspects of Si-based photonics
  • VCSEL fabrication, VCSEL design, low volume production, prototypes
  • Photonic structures fabrication (gratings, photonic crystals, etc.)
  • Development of DBRs for resonant cavities in a wide range of research and novel applications
  • UV photodetectors, including GaN APDs
  • All aspect of GaN HEMT power devices
  • All aspects of GaN vertical devices
  • All aspects of Gallium Oxide vertical devices
  • Wereable electronics and sensing systems
  • Nanometrology, gravimetric sensors
  • THz detection theories

Main expertises

  • die bonding, wire bonding, projection welding (TO-type packages), wafer to wafer bonding

Research interests

  • All issues related to micro-assembly and encapsulation of sensors, development of packaging methods including scaling of prototypes for low volume production
Meet the team

Minatec –  CROMA
3 Parvis Louis Néel, CS 50257
38016 Grenoble Cedex 1,  France

+33 456 52 95 09
 sinano@minatec.grenoble-inp.fr