Research Center Juelich
Contact person:
Qing-Tai Zhao
FZJ: Research Center Juelich
Forschungszentrum Jülich GmbH
52425 Jülich
Germany
Processing platform
- Micro/nanoelectronics clean room facility for CMOS/MEMS, III-V.
- CMOS processing down to 10nm (EBL)
- ALD/AVD for 300mm wafer (Al2O3, HfO2 based dielectric/ferroelectric, TiN, TaN)
- CVD for 200mm wafer (Si-Ge-Sn)
- Ion implantation: 0.2keV-250keV (up to 300mm wafer)
- RTP (up to 300mm wafer)
- Sputtering
- ….
Modelling platform
Characterization platform
Material characterization:
RBS/channeling, SIMS, XPS, XRD, high resolution TEM, AFM, APT, …
Device characterization:
I-V, C-V,P-V, cryo-measurements, Hall setup (till to 15K), pulse measurements