Research Center Juelich

Research Center Juelich

Contact person:

Qing-Tai Zhao


FZJ: Research Center Juelich

Forschungszentrum Jülich GmbH
52425 Jülich
Germany

  •  Micro/nanoelectronics clean room facility for CMOS/MEMS, III-V.
  • CMOS processing down to 10nm (EBL)
  • ALD/AVD for 300mm wafer (Al2O3, HfO2 based  dielectric/ferroelectric, TiN, TaN)
  • CVD for 200mm wafer (Si-Ge-Sn)
  • Ion implantation: 0.2keV-250keV (up to 300mm wafer)
  • RTP (up to 300mm wafer)
  • Sputtering
  • ….

Material characterization:
RBS/channeling, SIMS, XPS, XRD, high resolution TEM, AFM, APT,  …
Device characterization:
I-V, C-V,P-V, cryo-measurements, Hall setup (till to 15K), pulse measurements