INL – International Iberian Nanotechnology Laboratory
Contact persons:
Clivia Sotomayor-Torres
International Iberian Nanotechnology Laboratory
Avenida Mestre José Veiga s/n
4715-330 Braga
Portugal
Processing platform
- Thin Film Deposition and Material Growth:
- Molecular beam epitaxy of InSe, GaSe, In2Se3 2D materials
- Multi-target Singulus sputtering tool for magnetic tunnel junctions and thin-film multilayers (Timaris MTM)
- Multi-target confocal sputtering tool (Kenosistec)
- Metallization Singulus sputtering tool for Al, TiW(N) and Al2O3 (Timaris FTM)
- EasyTube 3000 Graphene CVD furnace system
- SPTS MPX CVD system for oxides, oxi:nitrides and a-Si:H deposition
- PECVD (800ºC) systems for CNT and carbon layers deposition tool (MicroSys 400 from Roth & Rau Microsystems)
- Cu Electroplating (AMMT GmbH)
- Atomic Layer Deposition (Beneq TFS 200)
Etching, Ashing, and Micromachining
- Broad Beam ion milling with SIMS end point detect (Nordiko 7500)
- Fluorine-based reactive ion etch system for oxides / nitrides (SPTS APS)
- Chlorine-based reactive ion etch systems for metals (SPTS ICP and SPTS C2L ICP)
- Silicon Deep reactive ion etching system (SPTS Pegasus)
- Plasma asher (PVA TEPLA M360)
- TMAH / KOH Si etch tanks (AMMT GmbH)
- Multiple fume hoods and wet benches for chemical processes (Quimipol)
- Oxide vapour etch release system (SPTS/PRIMAXX uEtch)
- XeF2 isotropic Si etch system (Xactic X4)
- Supercritical CO2 point dryer (Tousimis)
Optical and E-beam Lithography
- E-beam lithography tool (Vistec 5200 ES 100 kV)
- Nanoimprint Lithography (Obducat Eitre8)
- Direct write laser lithography (Heidelberg DWL 2000)
- Mask aligner (Karl Suss MA BA model)
- Optical resist track (Karl Suss Gamma Cluster)
- E-beam resist track (Karl Suss Gamma Cluster)
- Multiple ovens, including vapour priming
- Coater and hotplates for substrates up to 300 mm (SCS/EMS)
- Custom and uFab (Newport) femtosecond laser based 3D microfabrication (microprinting)
Advanced Packaging, Annealing, and Back-end Processes
- Chemical Mechanical Planarization (Logitech ORBIS)
- Dicing saw (Disco DAD 3500)
- Wire Bonder / Aluminium Wedge, Pick and Place (TPT HB)
- Wire Bonder / Gold ball bond (TPT HB)
- Pick and place (Finetech Fineplacer Sigma)
- Advanced desktop research printer (LP50 Roth & Rau B.V.)
- Magnetic Annealer with field up to 2T and temperature up to 400C (TEL, MATR 2000)
For more information: https://inl.int/services/research-core-facilities/micro-and-nanofabrication/
Modelling platform
- Ansys Lumerical
- Raytracing (Zemax)
Characterization platform
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- Conventional Transmission Electron Microscope (TEM): JEOL JEM-2100
- Probe corrected Scanning Transmission Electron Microscope (STEM): FEI Titan ChemiSTEM
- Double corrected TEM/STEM: FEI Titan Cubed Themis coupled with EELS, a segmented detector, a pixelated detector, a heating/biasing holder, a cryo holder, a liquid holder, a gas holder and a tomography holder.
- Dedicated Cryo-TEM: Thermo Scientific Glacios
- Scanning Electron Microscope (SEM)/Environmental SEM: FEI Quanta 650 FEG
- DualBeam Focused Ion Beam (FIB)-SEM: FEI Helios NanoLab 450S
- X-Ray Photoelectron Spectrometer: Thermo Scientific Escalab 250Xi
- Full-equipped sample preparation laboratory
More information: https://inl.int/wp-content/uploads/2024/01/INL_BROCHURES_AEMIS.pdf
Metrology, Inspection, and Wafer-Scale Device Testing
- High-resolution SEM (NanoSEM, FEI)
- Contact profilometer (KLA TENCOR P-16+)
- Resistivity mapper (AITCO)
- Optical profilometer/ellipsometer (OPM hyperion with confocal sensor / Ocean Optics NanoCalc XR)
- Multiple automated wafer probers for electrical testing and others
- Radio Frequency Electrical Characterization Laboratory (up to 40Ghz in frequency domain and 20GHz in time domain)
- Manual and motorized optical microscopes for Automatic Optical Inspection
Advanced multispectral microscopy setups:
- Custom developed Optical Decetected Magnetic Resonance (ODMR setups for quantum metrology) in widefield and confocal microscopes
- Fluorescence Lifetime Imaging (FLIM) microscopy setups
- Nonlinear SHG and MP-FLIM microscopy
- Streak imaging (spectral temporal characetrization)
Main Expertises | ||
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Beyond CMOS | Neuromorphic Computing |
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Phonon engineering |
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Small slope switches-NW/TFET/NEMS | x | |
Alternative materials-2D layers |
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Novel devices for ultra-low power |
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1D |
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Quantum Technologies & Very low temperature electronics |
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More Moore | Logic Nanodevices & circuits | x |
Memories |
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Very low power devices |
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High temperature electronics | x | |
More than Moore | Photonic devices |
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Micro-nano-bio Sensors & Systems |
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Energy Harvesting |
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RF devices & circuits |
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THz spectrum |
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Photonics devices |
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Power devices | x | |
Flexible electronics |
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Smart systems& Systems design | Smart systems |
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Systems design | Ultra high sensitivity: Pull-in transduction mechanism for inertial MEMS |
Research interests | ||
---|---|---|
Beyond CMOS | Neuromorphic Computing |
|
Phonon engineering |
|
|
Small slope switches-NW/TFET/NEMS | x | |
Alternative materials-2D layers |
|
|
Novel devices for ultra-low power |
|
|
1D |
|
|
Quantum Technologies & Very low temperature electronics |
|
|
More Moore | Logic Nanodevices & circuits | x |
Memories |
|
|
Very low power devices |
|
|
Photonic devices |
|
|
More than Moore | micro-nano-bio Sensors & Systems |
|
Energy Harvesting |
|
|
RF devices & circuits |
|
|
THz spectrum |
|
|
Photonics devices |
|
|
Flexible electronics | x | |
Smart systems |
|
|
System design | Ultra high sensitivity:
|