Chair for Micro – and Nanoelectronics at RWTH Aachen University

Chair for Micro – and Nanoelectronics at RWTH Aachen University

Contact persons:

Max Lemme

RWTH Aachen

Templergraben 55
52062 Aachen

Germany

  • Dielectric deposition: LPCVD, ALD (Si3N4, SiO2, Al2O3)
  • Thin film deposition: E-Beam evaporation, Sputtering (Al, Ti, TiN, W, Ni, Cr, Co, HfO2)
  • 2D material deposition: CVD (graphene), ALD, PECVD
  • Pattern transfer: ICP/RIE (anisotropic profiles, smooth surfaces, F and Cl based etch chemistry)
  • Lithography: E-Beam lithography, Optical lithography (6” Mask Aligner, 6” I-line stepper), Interference lithography, Nanoimprint lithography
  • Wet chemistry
  • Critical point drying
  • Wafer dicing
  • Lumerical FDTD (Photonics, Sensors)
  • Ansys Electronics HFSS (Photonics)
  • Phoenix OptoDesigner (Photonics)
  • Automated SEM
  • Raman spectroscopy (532 nm, 637nm, 785 nm laser): Photo luminescence, photo current mapping, in-situ pressure/humidity
  • Electrical characterization: temperature range (20 K -600 K), DC, RF (up to 110 GHz)
  • Optical characterization: Light sources with 850 nm, 1310 nm, 1550 nm, tunable sources, electro optic, temperature rang (20 K – 600 K)
  • Spectroscopic ellipsometry
  • Atomic force microscope
  •  Optical microscope