Best Paper Award – 2011
Place: Grenoble
Date: March 6, 2012
During ULIS’2012, for the 2nd time, the Medal and the Award were given by Francis Balestra to Lars Knoll, the author of “20nm gate length Schottky MOSFETs with ultra thin NiSi/epitaxial NiSi2 source/drain”, the Best ULIS’2011 Paper
