In this space, we usually promote some job offers from the SiNANO members (PhD, internship, post-doc, position…).
- 3PhD and one post-doc positions to work on advanced techniques for on-wafer characterization and modelling of SOI devices
The Louvain School of Engineering of Université catholique de Louvain (UCLouvain) is seeking for three RF Device Engineering PhD student (4 years) and one post-doc (3 years) to work on advanced techniques for on-wafer characterization and modelling of Silicon-on-Insulator (SOI) devices in a wide frequency and temperature ranges. You will also be expected to supervise master’s theses.
- The PhD students will be hosted by the RF-SOI Group of the Louvain School of Engineering. Under the guidance of Prof. J.-P. Raskin, the group has pioneered the widespread use of SOI for RF and microwave applications by establishing a clear path to transform lossy SOI substrates into quasi-lossless material. Thanks to those developments SOITEC’s eSI™ RF-SOI substrate has been able to displace III-V on the mobile handset RF switch market and at present almost all new smartphones have RF-SOI inside.
Details: here
Positions posted on 12/11
Apply with the support of the CROMA laboratory to the competitive entrance examinations for CNRS researcher permanent position.
Post-Doc position: Simulation and characterization of the influence of traps in the current fluctuations (LFN/RTN) of nanoscale FDSOI MOSFETs
In the framework of the IPCEI (Important Project of Common European Interest) and in collaboration with ST Microelectronics, we are working on the assessment of electrical noise phenomena in FDSOI MOSFETs, which are mainly related to oxide interface defects. In particular, a great focus is given in the study of Random Telegraph Noise (RTN), especially in its properties with regards to the shrinking of the channel length, which makes it challenging to predict or model. This type of noise can be detrimental for memory operation or CMOS imager performance.
We are offering :
• A 1-year (min.) full-time contract at a research laboratory internationally recognized for its
contribution in electrical characterization and noise studies, in the innovative city of Grenoble (France)
• A challenging topic with aspects of fundamental research and a simultaneously high industrial interest
• A combination of simulation and experimental work (all tools already available)
• A dynamic environment: 1 Research Associate and 1 Associate Professor supervising the work, 2 support engineers, 1 intern supporting the same topic and cutting-edge equipment for all necessary measurements and simulations
• The opportunity to work in close collaboration with a large industry like ST Microelectronics and potentially perform some additional measurements at ST Crolles
Details: here
Published on October 16/10/24.
Minatec – CROMA